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Solar Polycrystalline Silicon Wafer
Solar Polycrystalline Silicon Wafer
Price : On Request
Additional Pictures
Product Details
- Growth Method : Directional solidification
- Conductivity Type : P type
- Dopant : Boron
- Resistivity : 1~3Ω.cm
- Oxygen Content : 1×10 18 atom/cm 3
- Carbon Content : 4×10 17 atom/cm 3
- Side : 156.0mm ± 0.5mm
- Corner diagonal : 1.5mm ± 0.5mm
- Corner Angle : 45°±10°
- Thickness : 180±20μm; 200±20μm
- Surface : No stain or splash on surface
- TTV : ≤40μm
- Bow : ≤70μm
- Surface : No efect
- Saw Mark : ≤15μm